On Linewidth-based Yield Analysis for Nanometer Lithography
Publication Date
2009
Journal or Book Title
DATE: 2009 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION, VOLS 1-3
DOI
https://doi.org/10.1109/DATE.2009.5090693
Pages
381-386
Book Series Title
Design, Automation and Test in Europe Conference and Expo
Recommended Citation
Sreedhar, A and Kundu, S, "On Linewidth-based Yield Analysis for Nanometer Lithography" (2009). DATE: 2009 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION, VOLS 1-3. 891.
https://doi.org/10.1109/DATE.2009.5090693
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