Date of Award
9-2009
Document Type
Dissertation
Degree Name
Doctor of Philosophy (PhD)
Degree Program
Physics
First Advisor
Mark T. Tuominen, Chair
Second Advisor
Thomas P. Russell, Member
Third Advisor
Nikolay V. Prokofiev, Member
Keywords
Anti-reflective Coatings, Diblock Copolymers, Moth Eye Effect, Nanofabrication, Nanophotonics, Plasmonics
Subject Categories
Engineering
Abstract
This thesis reports the fabrication of nanophotonic structures by using electron beam lithography and using pattern transfer via self assembly with the aid of block copolymers. A theoretical and experimental basis was developed for fabricating anti-reflective coatings using block-copolymer pattern transfer. Block-copolymers were also used to fabricate plasmonic pattern arrays which form gold dots on glass surface. Electron-beam lithography was utilized to fabricate holey plasmonic structures from gold and silver films. Electron-beam exposure was used in block-copolymer lithography in selected regions. The exposure effects were studied for both thin and thick block-copolymer films. Reactive and ion beam etching techniques were used and optimized to fabricate those structures. This research required a great deal of development of new fabrication methods and key information is included in the body of the thesis.
Recommended Citation
Yavuzcetin, Ozgur, "Nanofabrication Techniques for Nanophotonics" (2009). Open Access Dissertations. Paper 124.
http://scholarworks.umass.edu/open_access_dissertations/124