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Document Type

Open Access

Degree Program

Mechanical Engineering

Degree Type

Master of Science (M.S.)

Year Degree Awarded

January 2008

Month Degree Awarded

September

Keywords

emboss, lithography, continuous, roll, nano, thermal

Abstract

As imprint lithography becomes commonplace in industrial manufacturing, the need for fast, reliable modifications to the process are of great importance. In particular, the Roll-to-Roll Nanoimprint Lithography (R2RNIL) method has been proven to yield large areas of continuous, robust patterns in the micro- and nanometer range. A thermal embossing R2RNIL system has been developed that is capable of providing a mold heating rate of 100ºC/s with sufficient temperature control to produce large-area patterns continuously at a rate in excess of four feet per minute. This process uses a novel looped-conveyor mold, allowing longer continuous patterns to be produced with superior temperature control than other methods of R2RNIL. Various patterns in the micro- and nanometer domains were replicated using this process.

First Advisor

Byung H. Kim

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