The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis

Authors

MS Valipa
T Bakos
ES Aydil
D Maroudas

Publication Date

2005

Journal or Book Title

Amorphous and Nanocrystalline Silicon Science and Technology-2005

DOI

https://doi.org/10.1557/PROC-862-A3.2

Pages

37-42

Volume

862

Book Series Title

MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

Recommended Citation

Valipa, MS; Bakos, T; Aydil, ES; and Maroudas, D, "The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis" (2005). Amorphous and Nanocrystalline Silicon Science and Technology-2005. 338.
https://doi.org/10.1557/PROC-862-A3.2