Surface smoothness of plasma-deposited amorphous silicon thin films: Surface diffusion of radical precursors and mechanism of Si incorporation
Publication Date
2006
Journal or Book Title
PHYSICAL REVIEW B
DOI
https://doi.org/10.1103/PhysRevB.74.205324
Pages
-
Volume
74
Issue
20
Recommended Citation
Valipa, MS; Bakos, T; and Maroudas, D, "Surface smoothness of plasma-deposited amorphous silicon thin films: Surface diffusion of radical precursors and mechanism of Si incorporation" (2006). PHYSICAL REVIEW B. 341.
https://doi.org/10.1103/PhysRevB.74.205324
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