Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H-2 plasmas

Authors

S Sriraman
MS Valipa
ES Aydil
D Maroudas

Publication Date

2006

Journal or Book Title

JOURNAL OF APPLIED PHYSICS

DOI

https://doi.org/10.1063/1.2229426

Pages

-

Volume

100

Issue

5

Recommended Citation

Sriraman, S; Valipa, MS; Aydil, ES; and Maroudas, D, "Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H-2 plasmas" (2006). JOURNAL OF APPLIED PHYSICS. 345.
https://doi.org/10.1063/1.2229426