Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H-2 plasmas
Publication Date
2006
Journal or Book Title
JOURNAL OF APPLIED PHYSICS
DOI
https://doi.org/10.1063/1.2229426
Pages
-
Volume
100
Issue
5
Recommended Citation
Sriraman, S; Valipa, MS; Aydil, ES; and Maroudas, D, "Hydrogen-induced crystallization of amorphous silicon thin films. I. Simulation and analysis of film postgrowth treatment with H-2 plasmas" (2006). JOURNAL OF APPLIED PHYSICS. 345.
https://doi.org/10.1063/1.2229426
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