Current-driven interactions between voids in metallic interconnect lines and their effects on line electrical resistance
Publication Date
2006
Journal or Book Title
APPLIED PHYSICS LETTERS
DOI
https://doi.org/10.1063/1.2207849
Pages
-
Volume
88
Issue
22
Recommended Citation
Cho, J; Gungor, MR; and Maroudas, D, "Current-driven interactions between voids in metallic interconnect lines and their effects on line electrical resistance" (2006). APPLIED PHYSICS LETTERS. 347.
https://doi.org/10.1063/1.2207849
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