Kinetics of strain relaxation in Si1-xGex thin films on Si(100) substrates: Modeling and comparison with experiments
Publication Date
2006
Journal or Book Title
APPLIED PHYSICS LETTERS
DOI
https://doi.org/10.1063/1.2162683
Pages
-
Volume
88
Issue
2
Recommended Citation
Kolluri, K; Zepeda-Ruiz, LA; Murthy, CS; and Maroudas, D, "Kinetics of strain relaxation in Si1-xGex thin films on Si(100) substrates: Modeling and comparison with experiments" (2006). APPLIED PHYSICS LETTERS. 348.
https://doi.org/10.1063/1.2162683
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