Kinetics of strain relaxation in Si1-xGex thin films on Si(100) substrates: Modeling and comparison with experiments

Authors

K Kolluri
LA Zepeda-Ruiz
CS Murthy
D Maroudas

Publication Date

2006

Journal or Book Title

APPLIED PHYSICS LETTERS

DOI

https://doi.org/10.1063/1.2162683

Pages

-

Volume

88

Issue

2

Recommended Citation

Kolluri, K; Zepeda-Ruiz, LA; Murthy, CS; and Maroudas, D, "Kinetics of strain relaxation in Si1-xGex thin films on Si(100) substrates: Modeling and comparison with experiments" (2006). APPLIED PHYSICS LETTERS. 348.
https://doi.org/10.1063/1.2162683