Atomistic analysis of the mechanism of hydrogen diffusion in plasma-deposited amorphous silicon thin films
Publication Date
2005
Journal or Book Title
APPLIED PHYSICS LETTERS
DOI
https://doi.org/10.1063/1.2158033
Pages
-
Volume
87
Issue
26
Recommended Citation
Valipa, MS and Maroudas, D, "Atomistic analysis of the mechanism of hydrogen diffusion in plasma-deposited amorphous silicon thin films" (2005). APPLIED PHYSICS LETTERS. 349.
https://doi.org/10.1063/1.2158033
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