Temperature dependence of precursor-surface interactions in plasma deposition of silicon thin films

Authors

T Bakos
M Valipa
ES Aydil
D Maroudas

Publication Date

2005

Journal or Book Title

CHEMICAL PHYSICS LETTERS

DOI

https://doi.org/10.1016/j.cplett.2005.07.107

Pages

61-65

Volume

414

Issue

1-3

Recommended Citation

Bakos, T; Valipa, M; Aydil, ES; and Maroudas, D, "Temperature dependence of precursor-surface interactions in plasma deposition of silicon thin films" (2005). CHEMICAL PHYSICS LETTERS. 355.
https://doi.org/10.1016/j.cplett.2005.07.107