Temperature dependence of precursor-surface interactions in plasma deposition of silicon thin films
Publication Date
2005
Journal or Book Title
CHEMICAL PHYSICS LETTERS
DOI
https://doi.org/10.1016/j.cplett.2005.07.107
Pages
61-65
Volume
414
Issue
1-3
Recommended Citation
Bakos, T; Valipa, M; Aydil, ES; and Maroudas, D, "Temperature dependence of precursor-surface interactions in plasma deposition of silicon thin films" (2005). CHEMICAL PHYSICS LETTERS. 355.
https://doi.org/10.1016/j.cplett.2005.07.107
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