Atomic-scale analysis of fundamental mechanisms of surface valley filling during plasma deposition of amorphous silicon thin films

Authors

MS Valipa
S Sriraman
ES Aydil
D Maroudas

Publication Date

2005

Journal or Book Title

SURFACE SCIENCE

Pages

123-143

Volume

574

Issue

2-3

Recommended Citation

Valipa, MS; Sriraman, S; Aydil, ES; and Maroudas, D, "Atomic-scale analysis of fundamental mechanisms of surface valley filling during plasma deposition of amorphous silicon thin films" (2005). SURFACE SCIENCE. 363.
Retrieved from https://scholarworks.umass.edu/che_faculty_pubs/363