Growth and characterization of hydrogenated amorphous silicon thin films from SiH2 radical precursor: Atomic-scale analysis
Publication Date
2004
Journal or Book Title
JOURNAL OF APPLIED PHYSICS
DOI
https://doi.org/10.1063/1.1636512
Pages
1792-1805
Volume
95
Issue
4
Recommended Citation
Sriraman, S; Aydil, ES; and Maroudas, D, "Growth and characterization of hydrogenated amorphous silicon thin films from SiH2 radical precursor: Atomic-scale analysis" (2004). JOURNAL OF APPLIED PHYSICS. 370.
https://doi.org/10.1063/1.1636512
COinS