Mechanisms and energetics of hydride dissociation reactions on surfaces of plasma-deposited silicon thin films
Publication Date
2007
Journal or Book Title
JOURNAL OF CHEMICAL PHYSICS
DOI
https://doi.org/10.1063/1.2781393
Pages
-
Volume
127
Issue
19
Recommended Citation
Singh, T; Valipa, MS; Mountziaris, TJ; and Maroudasa, D, "Mechanisms and energetics of hydride dissociation reactions on surfaces of plasma-deposited silicon thin films" (2007). JOURNAL OF CHEMICAL PHYSICS. 584.
https://doi.org/10.1063/1.2781393
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