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Nanofabrication techniques for nanophotonics
Abstract
This thesis reports the fabrication of nanophotonic structures by using electron beam lithography and using pattern transfer via self assembly with the aid of block copolymers. A theoretical and experimental basis was developed for fabricating anti-reflective coatings using block-copolymer pattern transfer. Block-copolymers were also used to fabricate plasmonic pattern arrays which form gold dots on glass surface. Electron-beam lithography was utilized to fabricate holey plasmonic structures from gold and silver films. Electron-beam exposure was used in block-copolymer lithography in selected regions. The exposure effects were studied for both thin and thick block-copolymer films. Reactive and ion beam etching techniques were used and optimized to fabricate those structures. This research required a great deal of development of new fabrication methods and key information is included in the body of the thesis.
Subject Area
Condensed matter physics|Materials science
Recommended Citation
Yavuzcetin, Ozgur, "Nanofabrication techniques for nanophotonics" (2009). Doctoral Dissertations Available from Proquest. AAI3380042.
https://scholarworks.umass.edu/dissertations/AAI3380042