Title
Remote phonon scattering in Si and Ge with SiO2 and HfO2 insulators: Does the electron mobility determine short channel performance?
Publication Date
2007
Journal or Book Title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS
Pages
3265-3272
Volume
46
Issue
5B
Recommended Citation
O'Regan, T and Fischetti, M, "Remote phonon scattering in Si and Ge with SiO2 and HfO2 insulators: Does the electron mobility determine short channel performance?" (2007). JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. 247.
Retrieved from https://scholarworks.umass.edu/ece_faculty_pubs/247
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