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MURI on Photomechanical Materials
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Patterning Submicron Photomechanical Features into Single Diarylethene Crystals Using Electron Beam Lithography.
Publication
Patterning Submicron Photomechanical Features into Single Diarylethene Crystals Using Electron Beam Lithography.
Li, Wangxiang
;
Kitagawa, Daichi
;
Kobatake, Seiya
;
Bekyarova, Elena
;
Bardeen, Christopher J
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article
article
Date
2022-01-01
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d2nh00205a.html
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https://hdl.handle.net/20.500.14394/36142
DOI
https://doi.org/10.1039/D2NH00205A
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https://pubs.rsc.org/en/content/articlehtml/2022/nh/d2nh00205a
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