Deposition of device-quality conformal copper films from supercritical carbon dioxide.

Authors

JM Blackburn
A Cabanas
DP Long
JJ Watkins

Publication Date

2002

Journal or Book Title

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY

Pages

U663-U664

Volume

223

Recommended Citation

Blackburn, JM; Cabanas, A; Long, DP; and Watkins, JJ, "Deposition of device-quality conformal copper films from supercritical carbon dioxide." (2002). ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. 1118.
Retrieved from https://scholarworks.umass.edu/pse_faculty_pubs/1118