Quantifying release in step-and-flash imprint lithography
Publication Date
2006
Journal or Book Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Pages
2716-2722
Volume
24
Issue
6
Recommended Citation
Chan, EP and Crosby, AJ, "Quantifying release in step-and-flash imprint lithography" (2006). JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. 172.
Retrieved from https://scholarworks.umass.edu/pse_faculty_pubs/172
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