Controlled growth of silicon dioxide from "nanoholes" in silicon-supported tris(trimethylsiloxy)silyl monolayers: Rational control of surface roughness at the nanometer length scale
Publication Date
2003
Journal or Book Title
LANGMUIR
Pages
2449-2457
Volume
19
Issue
6
Recommended Citation
Jia, XQ and McCarthy, TJ, "Controlled growth of silicon dioxide from "nanoholes" in silicon-supported tris(trimethylsiloxy)silyl monolayers: Rational control of surface roughness at the nanometer length scale" (2003). LANGMUIR. 707.
Retrieved from https://scholarworks.umass.edu/pse_faculty_pubs/707
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