The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis

Valipa, MSBakos, TAydil, ESMaroudas, D2024-04-262024-04-26200510.1557/PROC-862-A3.2https://hdl.handle.net/20.500.14394/5739The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysisarticle