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Master of Science (M.S.)
Year Degree Awarded
Month Degree Awarded
emboss, lithography, continuous, roll, nano, thermal
As imprint lithography becomes commonplace in industrial manufacturing, the need for fast, reliable modifications to the process are of great importance. In particular, the Roll-to-Roll Nanoimprint Lithography (R2RNIL) method has been proven to yield large areas of continuous, robust patterns in the micro- and nanometer range. A thermal embossing R2RNIL system has been developed that is capable of providing a mold heating rate of 100ºC/s with sufficient temperature control to produce large-area patterns continuously at a rate in excess of four feet per minute. This process uses a novel looped-conveyor mold, allowing longer continuous patterns to be produced with superior temperature control than other methods of R2RNIL. Various patterns in the micro- and nanometer domains were replicated using this process.
Byung H. Kim