Title
The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis
Publication Date
2005
Journal or Book Title
Amorphous and Nanocrystalline Silicon Science and Technology-2005
Volume
862
Pages
37-42
Book Series Title
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Recommended Citation
Valipa, MS; Bakos, T; Aydil, ES; and Maroudas, D, "The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis" (2005). Amorphous and Nanocrystalline Silicon Science and Technology-2005. 338.
Retrieved from https://scholarworks.umass.edu/che_faculty_pubs/338
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