Title
The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis
Publication Date
2005
Journal or Book Title
Amorphous and Nanocrystalline Silicon Science and Technology-2005
DOI
https://doi.org/10.1557/PROC-862-A3.2
Pages
37-42
Volume
862
Book Series Title
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Recommended Citation
Valipa, MS; Bakos, T; Aydil, ES; and Maroudas, D, "The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis" (2005). Amorphous and Nanocrystalline Silicon Science and Technology-2005. 338.
https://doi.org/10.1557/PROC-862-A3.2
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