Title

The role of SiH3 diffusion in determining the surface smoothness of plasma-deposited amorphous Si thin films: An atomic-scale analysis

Publication Date

2005

Journal or Book Title

Amorphous and Nanocrystalline Silicon Science and Technology-2005

DOI

10.1557/PROC-862-A3.2

Volume

862

Pages

37-42

Book Series Title

MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS

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