Thermally activated mechanisms of hydrogen abstraction by growth precursors during plasma deposition of silicon thin films
Publication Date
2005
Journal or Book Title
JOURNAL OF CHEMICAL PHYSICS
DOI
https://doi.org/10.1063/1.1839556
Pages
-
Volume
122
Issue
5
Recommended Citation
Bakos, T; Valipa, MS; and Maroudas, D, "Thermally activated mechanisms of hydrogen abstraction by growth precursors during plasma deposition of silicon thin films" (2005). JOURNAL OF CHEMICAL PHYSICS. 361.
https://doi.org/10.1063/1.1839556
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