Atomistic calculation of the SiH3 surface reactivity during plasma deposition of amorphous silicon thin films
Publication Date
2004
Journal or Book Title
SURFACE SCIENCE
DOI
https://doi.org/10.1016/j.susc.2004.08.029
Pages
L339-L347
Volume
572
Issue
2-3
Recommended Citation
Valipa, MS; Aydil, ES; and Maroudas, D, "Atomistic calculation of the SiH3 surface reactivity during plasma deposition of amorphous silicon thin films" (2004). SURFACE SCIENCE. 365.
https://doi.org/10.1016/j.susc.2004.08.029
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