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Analysis of trace impurities in organometallic semiconductor grade reagent materials using electrothermal vaporization - inductively coupled plasma spectrometry
Abstract
Trace impurity determinations in volatile, pyrophoric organometallic materials is complicated owing to its chemical nature. Furthermore, trends toward high semiconductor circuit density demand that impurity determinations are performed at increasingly low levels. Volatility of the impurities is also desired as it plays a significant role in impurity incorporation in semiconductor products. Determination of both volatile and nonvolatile impurities in semiconductor-grade organometallic reagent materials has been accomplished using electrothermal vaporization - inductively coupled plasma spectrometry. Solid or liquid materials can be dispensed directly onto a graphite microboat, and application of an appropriate time-temperature ramp allows separation of impurities based on volatility. Temporal separation allows quantitative capabilities on both volatile and nonvolatile signals in a single ETV run. Calibration efforts for volatile impurities have been compared with results from exponential dilution and direct vapor sampling techniques. Nonvolatile impurity determinations can be reasonably performed with aqueous external standard calibration. Inductively coupled plasma-mass spectrometry provides an alternate and more sensitive, multielement detection method. Several spectroscopic and non-spectroscopic difficulties with volatile impurity detection remain. Nonetheless, qualitative and semi-quantitative ($<$50% RSD) determination of most impurities may be performed in a single ETV run.
Subject Area
Analytical chemistry|Materials science
Recommended Citation
Argentine, Mark David, "Analysis of trace impurities in organometallic semiconductor grade reagent materials using electrothermal vaporization - inductively coupled plasma spectrometry" (1993). Doctoral Dissertations Available from Proquest. AAI9408248.
https://scholarworks.umass.edu/dissertations/AAI9408248