Photocurable resists for imprint lithography.
Publication Date
2005
Journal or Book Title
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Pages
U1119-U1119
Volume
229
Recommended Citation
Carter, KR, "Photocurable resists for imprint lithography." (2005). ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY. 42.
Retrieved from https://scholarworks.umass.edu/pse_faculty_pubs/42
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