As imprint lithography becomes commonplace in industrial manufacturing, the need for fast, reliable modifications to the process are of great importance. In particular, the Roll-to-Roll Nanoimprint Lithography (R2RNIL) method has been proven to yield large areas of continuous, robust patterns in the micro- and nanometer range. A thermal embossing R2RNIL system has been developed that is capable of providing a mold heating rate of 100ºC/s with sufficient temperature control to produce large-area patterns continuously at a rate in excess of four feet per minute. This process uses a novel looped-conveyor mold, allowing longer continuous patterns to be produced with superior temperature control than other methods of R2RNIL. Various patterns in the micro- and nanometer domains were replicated using this process.